-
2
-
-
0032720004
-
Microchemical systems: Status, challenges and opportunities
-
Jensen K F 1999 Microchemical systems: status, challenges and opportunities AIChE J. 45 2051-4
-
(1999)
AIChE J.
, vol.45
, pp. 2051-2054
-
-
Jensen, K.F.1
-
3
-
-
0142087216
-
Influence of coil power on the etching characteristics on a high density plasma etcher
-
Ayon A A, Braff R A, Bayt R, Sawin H H and Schmidt M A 1999 Influence of coil power on the etching characteristics on a high density plasma etcher J. Electrochem. Soc. 146 2730-6
-
(1999)
J. Electrochem. Soc.
, vol.146
, pp. 2730-2736
-
-
Ayon, A.A.1
Braff, R.A.2
Bayt, R.3
Sawin, H.H.4
Schmidt, M.A.5
-
4
-
-
0000450003
-
LIGA and related technologies for industrial application
-
Menz W 1996 LIGA and related technologies for industrial application Sensors Actuators A 54 785-9
-
(1996)
Sensors Actuators A
, vol.54
, pp. 785-789
-
-
Menz, W.1
-
7
-
-
0031570953
-
Microchannel electrophoretic separations of DNA in injection-molded plastic substrates
-
McCormick R M, Nelson R J, Alonso-Amigo M G, Benvegnu D J and Hooper H H 1997 Microchannel electrophoretic separations of DNA in injection-molded plastic substrates Anal. Chem. 69 2626-30
-
(1997)
Anal. Chem.
, vol.69
, pp. 2626-2630
-
-
McCormick, R.M.1
Nelson, R.J.2
Alonso-Amigo, M.G.3
Benvegnu, D.J.4
Hooper, H.H.5
-
8
-
-
0034656239
-
Room-temperature imprinting method for plastic microchannel fabrication
-
Xu J, Locascio L, Gaitan M and Lee C S 2000 Room-temperature imprinting method for plastic microchannel fabrication Anal. Chem. 72 1930-3
-
(2000)
Anal. Chem.
, vol.72
, pp. 1930-1933
-
-
Xu, J.1
Locascio, L.2
Gaitan, M.3
Lee, C.S.4
-
9
-
-
0031221057
-
SU-8: A low-cost negative resist for MEMS
-
Lorenz H, Despont M, Fahrni N, Labianca N, Renaud P and Vettiger P 1997 SU-8: A low-cost negative resist for MEMS J. Micromech. Microeng. 7 121-4
-
(1997)
J. Micromech. Microeng.
, vol.7
, pp. 121-124
-
-
Lorenz, H.1
Despont, M.2
Fahrni, N.3
Labianca, N.4
Renaud, P.5
Vettiger, P.6
-
10
-
-
0031674888
-
High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
-
Lorenz H, Despont M, Fahrni N, Brugger J, Vettiger P and Renaud P 1998 High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS Sensors Actuators A 64 33-9
-
(1998)
Sensors Actuators A
, vol.64
, pp. 33-39
-
-
Lorenz, H.1
Despont, M.2
Fahrni, N.3
Brugger, J.4
Vettiger, P.5
Renaud, P.6
-
11
-
-
0030646206
-
Negative photoresists for optical lithography
-
Shaw J M, Gelorme J D, LaBianca N C, Conley W E and Holmes S J 1997 Negative photoresists for optical lithography IBM J. Res. Dev. 41 81-94
-
(1997)
IBM J. Res. Dev.
, vol.41
, pp. 81-94
-
-
Shaw, J.M.1
Gelorme, J.D.2
LaBianca, N.C.3
Conley, W.E.4
Holmes, S.J.5
-
12
-
-
0032064598
-
Buried microchannels in polymer for delivering solutions to neurons in a network
-
Heuschkel M O, Guerin L, Buisson B, Bertrand D and Renaud P 1998 Buried microchannels in polymer for delivering solutions to neurons in a network Sensors Actuators B 48 356-61
-
(1998)
Sensors Actuators B
, vol.48
, pp. 356-361
-
-
Heuschkel, M.O.1
Guerin, L.2
Buisson, B.3
Bertrand, D.4
Renaud, P.5
-
13
-
-
0000351682
-
Microreactors and electrochemical detectors fabricated using Si and EPON SU-8
-
L'Hostis E, Michel P E, Fiaccabrino G C, Strike D J, de Rooij N F and Koudelka-Hep M 2000 Microreactors and electrochemical detectors fabricated using Si and EPON SU-8 Sensors Actuators B 64 156-62
-
(2000)
Sensors Actuators B
, vol.64
, pp. 156-162
-
-
L'Hostis, E.1
Michel, P.E.2
Fiaccabrino, G.C.3
Strike, D.J.4
De Rooij, N.F.5
Koudelka-Hep, M.6
-
14
-
-
0033101199
-
Electrical impedance spectroscopy using microchannels with integrated metal electrodes
-
Ayliffe H E, Frazier A B and Rabbitt R D 1999 Electrical impedance spectroscopy using microchannels with integrated metal electrodes J. Microelectromech. Syst. 8 50-7
-
(1999)
J. Microelectromech. Syst.
, vol.8
, pp. 50-57
-
-
Ayliffe, H.E.1
Frazier, A.B.2
Rabbitt, R.D.3
-
15
-
-
0030649160
-
Simple and low cost fabrication of embedded microchannels by using a new thick-film photoplastic
-
Guerin L J, Bossel M, Demierre M, Calmes S and Renaud P 1997 Simple and low cost fabrication of embedded microchannels by using a new thick-film photoplastic Int. Conf. on Solid-State Sensors and Actuators, Transducers '97 pp 1419-21
-
(1997)
Int. Conf. on Solid-state Sensors and Actuators, Transducers '97
, pp. 1419-1421
-
-
Guerin, L.J.1
Bossel, M.2
Demierre, M.3
Calmes, S.4
Renaud, P.5
-
17
-
-
0031270502
-
Micromachined reactors for catalytic partial oxidation reactions
-
Srinivasan R, Hsing I-M, Berger P E, Firebaugh S, Jensen K F, Schmidt M A, Harold M P, Lerou J J and Ryley J F 1997 Micromachined reactors for catalytic partial oxidation reactions AIChE J. 43 3059-69
-
(1997)
AIChE J.
, vol.43
, pp. 3059-3069
-
-
Srinivasan, R.1
Hsing, I.-M.2
Berger, P.E.3
Firebaugh, S.4
Jensen, K.F.5
Schmidt, M.A.6
Harold, M.P.7
Lerou, J.J.8
Ryley, J.F.9
-
19
-
-
0001402505
-
Towards organic synthesis in microfluidic devices: Multicomponent reactions for the construction of compound libraries
-
Dordrecht: Kluwer
-
Mitchell M C, Spikmans V, Bessoth F, Manz A and de Mello A 2000 Towards organic synthesis in microfluidic devices: multicomponent reactions for the construction of compound libraries Micro Total Analysis Systems 2000 (Dordrecht: Kluwer) pp 463-5
-
(2000)
Micro Total Analysis Systems 2000
, pp. 463-465
-
-
Mitchell, M.C.1
Spikmans, V.2
Bessoth, F.3
Manz, A.4
De Mello, A.5
-
20
-
-
21044433234
-
Microfabricated CE chips with optical slit for UV absorption detection
-
Dordrecht: Kluwer
-
Nishimoto T, Fujiyama Y, Abe H, Kanai M, Nakanishi H and Arai A 2000 Microfabricated CE chips with optical slit for UV absorption detection Micro Total Analysis Systems 2000 (Dordrecht: Kluwer) pp 395-8
-
(2000)
Micro Total Analysis Systems 2000
, pp. 395-398
-
-
Nishimoto, T.1
Fujiyama, Y.2
Abe, H.3
Kanai, M.4
Nakanishi, H.5
Arai, A.6
-
21
-
-
0030287823
-
Rapid prototyping of complex structures with feature sizes larger than 20 mm
-
Qin D, Xia Y and Whitesides G M 1996 Rapid prototyping of complex structures with feature sizes larger than 20 mm Adv. Mater. 8 917-9
-
(1996)
Adv. Mater.
, vol.8
, pp. 917-919
-
-
Qin, D.1
Xia, Y.2
Whitesides, G.M.3
-
22
-
-
0030677606
-
High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications
-
Despot M, Lorenz H, Fahrni N, Brugger J, Renaud P and Vettiger P 1997 High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications IEEE Tenth Annual Workshop on MicroElectroMechanical Systems pp 518-22
-
(1997)
IEEE Tenth Annual Workshop on Microelectromechanical Systems
, pp. 518-522
-
-
Despot, M.1
Lorenz, H.2
Fahrni, N.3
Brugger, J.4
Renaud, P.5
Vettiger, P.6
|