High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

Sensors and Actuators, A: Physical

Volumn 64, Issue 1, 1998, Pages 33-39

  Lorenz, H ^a   Despont, M ^b   Fahrni, N ^a   Brugger, J ^b   Vettiger, P ^b   Renaud, P ^a  

^a EPFL   (Switzerland)

^b IBM RESEARCH ZURICH   (Switzerland)

Author keywords

Electroplating; High aspect ratio; LIGA type applications; Near UV photoresists; Negative tone; Photoplastic

Indexed keywords

ASPECT RATIO; ELECTROPLATING; FABRICATION; MICROELECTROMECHANICAL DEVICES;

HIGH ASPECT RATIO; NEGATIVE TONE; PHOTOPLASTIC;

PHOTORESISTS;

EID: 0031674888     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)80055-1     Document Type: Article

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