Dark-field electron holography for the measurement of geometric phase

Ultramicroscopy

Volumn 111, Issue 8, 2011, Pages 1328-1337

  Hytch, M J ^a   Houdellier, F ^a   Hue F ^a,b   Snoeck, E ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Dark field electron holography; Electron holography; Geometric phase; Strain

Indexed keywords

BRIGHTFIELD; DARK-FIELD; DARK-FIELD ELECTRON HOLOGRAPHY; DIFFRACTED BEAMS; ELECTRON HOLOGRAMS; EXPERIMENTAL CONDITIONS; GEOMETRIC PHASE; OFF-AXIS ELECTRON HOLOGRAPHY; PHASE RECONSTRUCTION; THEORETICAL BASIS; THEORETICAL FRAMEWORK; THICKNESS VARIATION;

ELECTRON HOLOGRAPHY; GEOMETRY; HOLOGRAMS; PHASE MEASUREMENT;

ELECTRONS;

ACCURACY; ARTICLE; BRIGHT FIELD ELECTRON HOLOGRAM; CRYSTAL STRUCTURE; DARK FIELD ELECTRON HOLOGRAPHY; GEOMETRY; HOLOGRAPHY; MAGNETISM; MEASUREMENT; PHOTOGRAPHY; RANDOM ERROR; SEMICONDUCTOR; STATIC ELECTRICITY; SYSTEMATIC ERROR; THICKNESS;

EID: 80051813055     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2011.04.008     Document Type: Article

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