Quantitative measurement of displacement and strain fields from HREM micrographs

Ultramicroscopy

Volumn 74, Issue 3, 1998, Pages 131-146

  Hytch M J ^a   Snoeck, E ^b   Kilaas, R ^c  

^a CNRS   (France)

^b CEMES CNRS   (France)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

High resolution electron microscopy; Strain fields

Indexed keywords

FERROELECTRIC MATERIALS; FOURIER TRANSFORMS; IMAGE ANALYSIS; LEAD COMPOUNDS; STRAIN MEASUREMENT;

LEAD TITANATE;

HIGH RESOLUTION ELECTRON MICROSCOPY;

ARTICLE; ELECTRON MICROSCOPY; ELECTRON TRANSPORT; IMAGE ENHANCEMENT; IMAGE PROCESSING; MATHEMATICAL ANALYSIS; QUANTITATIVE ASSAY;

EID: 0037519622     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(98)00035-7     Document Type: Article

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