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Ultramicroscopy

Volumn 87, Issue 4, 2001, Pages 199-212

Imaging conditions for reliable measurement of displacement and strain in high-resolution electron microscopy

(2) Hytch M J a Plamann, T a

a CNRS (France)

Author keywords

High resolution electron microscopy; Image formation; Strain fields

Indexed keywords

COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; IMAGING TECHNIQUES; LATTICE CONSTANTS; LENSES; STRAIN;

ATOMIC PLANES;

ELECTRON MICROSCOPY;

ATOM; CRYSTAL; ELECTRON MICROSCOPY; ERROR; HIGH RESOLUTION ELECTRON MICROSCOPY; IMAGING; LENS; MEASUREMENT; OPTICAL RESOLUTION; PHYSICAL STRESS; QUANTUM MECHANICS; RELIABILITY; SHORT SURVEY; THEORY; WAVEFORM;

EID: 0035054877 PISSN: 03043991 EISSN: None Source Type: Journal
DOI: 10.1016/S0304-3991(00)00099-1 Document Type: Article

Times cited : (152)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.