Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions

Journal of Applied Physics

Volumn 109, Issue 7, 2011, Pages

  Welzel, Th ^a   Naumov, S ^b   Ellmer, K ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b Leibniz Institut Fr Oberflchenmodifizierung EV   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH; DIFFERENT ORIGINS; ELECTRON ATTACHMENT; ENERGY SPECTRA; GASPHASE; HIGH ENERGY; ION DISTRIBUTIONS; MAGNETRON DISCHARGES; MOLECULAR IONS; PLASMA PROCESS; TARGET MATERIALS; TARGET SURFACE; WORKING GAS; CU TARGET; DC MAGNETRON SPUTTERING; DENSITY FUNCTIONAL THEORY CALCULATIONS; ENERGETIC ION; ENERGY DISTRIBUTIONS; ENERGY-RESOLVED MASS SPECTROMETRY; HIGH ENERGY TAILS; ION MASS; LOW-ENERGY PEAKS; MASS SPECTRA; PLASMA POTENTIAL; SPUTTER TARGET MATERIAL; SPUTTERED MATERIALS;

DENSITY FUNCTIONAL THEORY; DESORPTION; ELECTRON AFFINITY; MASS SPECTROMETRY; METAL WORKING; MOLECULES; NEGATIVE IONS; SPECTROSCOPY; ELECTRIC DISCHARGES; POSITIVE IONS;

SURFACES; ARGON;

EID: 79955420716     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3553846     Document Type: Conference Paper

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