Reactive magnetron sputtering of highly (001)-textured WS 2-x films: Influence of Ne +, Ar + and Xe + ion bombardment on the film growth

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 3, 2006, Pages 497-503

  Ellmer, K ^a   Seeger, S ^a   Sieber, I ^a   Bohne, W ^a   Rohrich J ^a   Strub, E ^a   Mientus, R ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b Opto Transmitter Umweltschutz Technologie eV   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC RECOIL DETECTION ANALYSIS; NEON BOMBARDMENT; VAN DER WAALS SEMICONDUCTOR;

MAGNETRON SPUTTERING; SILICON; SULFUR COMPOUNDS; VAN DER WAALS FORCES; X RAY DIFFRACTION ANALYSIS; XENON;

SEMICONDUCTING FILMS;

EID: 33644665287     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200521363     Document Type: Article

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