Analysis of relevant plasma parameters for ZnO:Al film deposition based on data from reactive and non-reactive DC magnetron sputtering

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 229-234

  Herrmann, D ^a   Oertel, M ^a   Menner, R ^a   Powalla, M ^a  

^a ZENTRUM FÜR SONNENENERGIE UND WASSERSTOFF FORSCHUNG BADEN WÜRTTEMBERG ZSW   (Germany)

Author keywords

CIGS solar modules; Langmuir probe; Plasma process monitor; Reactive magnetron sputter deposition; Transparent conducting oxide; Zinc aluminum oxide

Indexed keywords

CERAMIC MATERIALS; ION BOMBARDMENT; MAGNETIC FILMS; OPACITY; ZINC OXIDE;

ION ENERGY DISTRIBUTIONS;

MAGNETRON SPUTTERING;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18344413374     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00524-3     Document Type: Article

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