Numerical simulation of the discharge in d.c. magnetron sputtering

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 37-41

  Shidoji, Eiji ^a   Nakano, Nobuhiko ^b   Makabe, Toshiaki ^b  

^a ASAHI GLASS CO LTD   (Japan)

^b KEIO UNIVERSITY   (Japan)

Author keywords

Conductivity; Ion bombardment; Magnetron; Simulation

Indexed keywords

ANODES; CATHODES; COMPUTER SIMULATION; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; GLASS; ION BOMBARDMENT; MATHEMATICAL MODELS; PLASMA DENSITY;

EXCESS ELECTRON FLUX; FILM CONDUCTIVITY; HIGH ENERGY ION INJECTION; PLASMA POTENTIAL;

MAGNETRON SPUTTERING;

EID: 0033170249     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00151-0     Document Type: Article

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