Influence of negative ion resputtering on ZnO:Al thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 1, 2004, Pages 20-29

  Rieth, Loren W ^a,b   Holloway, Paul H ^a  

^a University of Florida   (United States)

^b UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HALL MOBILITY; LATTICE SPACING; NEGATIVE ION RESPUTTERING (NIR);

ACTIVATION ENERGY; ALUMINUM; ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; ELECTRON MOBILITY; GRAIN SIZE AND SHAPE; HALL EFFECT; ION IMPLANTATION; IONIZATION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

THIN FILMS;

EID: 1242306911     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1626641     Document Type: Article

References (32)

1. Y. Shimizu and M. Egashira, MRS Bull. 24, 18 (1999).
2. J. J. Osborne, G. T. Roberts, A. R. Chalmers, and S. Gabriel, Sens. Actuators B 63, 55 (2000).
3. S. J. Chang, Y. K. Su, and Y. P. Shei, J. Vac. Sci. Technol. A 13, 385 (1995).
4. H. Kawazoe, H. Yanagi, K. Ueda, and H. Hosono, Thin Solid Films 25, 28 (2000).
5. K. L. Chopra, S. Major, and D. K. Pandya, Thin Solid Films 102, 1 (1983).
6. H. Hartnagel, Semiconducting Transparent Thin Films (Institute of Physics, Philadelphia, PA, 1995).
7. D. S. Ginley and C. Bright, MRS Bull. 25, 15 (2000).
8. T. J. Coutts, D. L. Young, and X. Li, MRS Bull. 25, 58 (2000).
9. K. Ellmer, J. Phys. D 33, R17 (2000).
10. L. Rieth, Ph.D. dissertation, University of Florida, Gainesville, FL, 2001.
11. K. Tominaga, K. Kuroda, and O. Tada, Jpn. J. Appl. Phys., Part 1 27, 1176 (1988).
12. T. Minami, H. Sato, h. Nanto, and S. Takata, Jpn. J. Appl. Phys., Part 2 24, L781 (1985).
13. S. Zafar, C. S. Ferekides, and D. L. Morel, IEEE 1st World Conference on Photovoltaic Energy Conversion, Waikoloa, HI, 1994 (unpublished).
14. J. J. Cuomo, R. J. Gambino, J. M. E. Harper, and J. D. Kuptsis, IBM J. Res. Dev. 21, 580 (1977).
15. J. J. Cuomo, R. J. Gambino, J. M. E. Harper, J. D. Kuptsis, and J. C. Webber, J. Vac. Sci. Technol. 15, 281 (1978).
16. D. J. Kester and R. Messier, J. Vac. Sci. Technol. A 4, 496 (1986).
17. D. J. Kester and R. Messier, J. Mater. Res. 8, 1928 (1993).
18. D. J. Kester and R. Messier, J. Mater. Res. 8, 1938 (1993).
19. J. Phillips, Bonds and Bands in Semiconductors (Academic, New York, 1973).
20. R. Petschick, MacDiff diffraction analysis software (2000).
21. H. K. Pulker, Coatings on Glass (Elsevier, New York, 1984).
22. J. W. Mayer and S. S. Lau, Electronic Materials Science for Integrated Circuits in Si and GaAs (Macmillan, New York, 1990).
23. D. W. Huffman and J. A. Thornton, J. Vac. Sci. Technol. 17, 380 (1980).
24. H. Sato, T. Minami, S. Takata, T. Mouri, and N. Ogawa, Thin Solid Films 220, 327 (1992).
25. S. B. Zhang, S.-H. Wei, and A. Zunger, Phys. Rev. B 63, 63 (2001).
26. D. M. Smith, Thin-Film Deposition (McGraw-Hill, New York, 1995).
27. R. Jaeger, Introduction to Microelectronic Fabrication (Addison-Wesley, New York, 1993).
28. B. Chapman, Glow Discharge Processes (Wiley, New York, 1980).
29. J. M. E. Harper, J. J. Cuomo, R. J. Gambino, H. R. Kaufman, and R. S. Robinson, J. Vac. Sci. Technol. 15, 1597 (1978).
30. M. Ohring, The Materials Science of Thin Films (Academic, London, 1992).
31. R. C. Weast, Handbook of Chemistry and Physics (Chemical Rubber, Boca Raton, FL, 1981).
32. F. A. Kröger, The Chemistry of Imperfect Crystals (North-Holland, Amsterdam, 1964).