Improvements of spatial resistivity distribution in transparent conducting Al-doped ZnO thin films deposited by DC magnetron sputtering

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 2984-2987

  Oda, Jun ichi ^a   Nomoto, Jun ichi ^a   Miyata, Toshihiro ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

AZO; GZO; ITO; Magnetron sputtering; Thin film; Transparent conducting oxide; Transparent electrode; ZnO

Indexed keywords

AL-DOPED ZNO; AZO; AZO THIN FILMS; DC MAGNETRON SPUTTERING; IMPROVEMENT METHODS; LOW RESISTIVITY; OPTIMIZED CONDITIONS; RESISTIVITY DISTRIBUTIONS; RF COMPONENTS; RF-POWER; SUBSTRATE SURFACE; TRANSPARENT CONDUCTING OXIDE; TRANSPARENT ELECTRODE; ZNO;

ALUMINUM; CONDUCTIVE FILMS; ITO GLASS; MAGNETRON SPUTTERING; MAGNETRONS; SINTERING; TARGETS; THIN FILM DEVICES; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

FILM PREPARATION;

EID: 77649098997     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.174     Document Type: Article

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