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Volumn 256, Issue 6, 2010, Pages 1694-1697
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Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering
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Author keywords
Magnetron sputtering; Resputtering; Transparent conductive oxide (TCO); ZnO
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Indexed keywords
ALUMINA;
ALUMINUM OXIDE;
BINARY ALLOYS;
CARRIER CONCENTRATION;
II-VI SEMICONDUCTORS;
MAGNETRON SPUTTERING;
NEGATIVE IONS;
SUBSTRATES;
ZINC OXIDE;
AL DOPED ZNO THIN FILMS;
FREE CARRIER CONCENTRATION;
GLASS SUBSTRATES;
HIGH RESISTIVITY;
MID-FREQUENCIES;
RE-SPUTTERING;
SUBSTRATE POSITIONS;
TRANSPARENT CONDUCTIVE OXIDES;
THIN FILMS;
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EID: 72549109299
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2009.09.096 Document Type: Article |
Times cited : (36)
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References (33)
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