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Volumn 256, Issue 6, 2010, Pages 1694-1697

Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

Author keywords

Magnetron sputtering; Resputtering; Transparent conductive oxide (TCO); ZnO

Indexed keywords

ALUMINA; ALUMINUM OXIDE; BINARY ALLOYS; CARRIER CONCENTRATION; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; NEGATIVE IONS; SUBSTRATES; ZINC OXIDE;

EID: 72549109299     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.09.096     Document Type: Article
Times cited : (36)

References (33)
  • 26
    • 72549118471 scopus 로고    scopus 로고
    • Vienna University of Technology
    • Vienna University of Technology, A Simple Sputter Yield Calculator, http://eaps4.iap.tuwien.ac.at/www/surface/script/sputteryield.html.
    • Sputter Yield Calculator
    • Simple, A.1
  • 30
    • 0003998388 scopus 로고    scopus 로고
    • Lide D.R. (Ed), CRC, Boca Raton, FL pp. (5-6)-(5-23) and (9-52)-(9-56)
    • In: Lide D.R. (Ed). CRC Handbook of Chemistry and Physics (2002), CRC, Boca Raton, FL pp. (5-6)-(5-23) and (9-52)-(9-56)
    • (2002) CRC Handbook of Chemistry and Physics


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.