Reliability studies on Ta2O5 high-κ dielectric metal-insulator-metal capacitors prepared by wet anodization

Journal of Vacuum Science and Technology B

Volumn 29, Issue 1, 2011, Pages

  Sedghi, N ^a   Davey, W ^a   Mitrovic, I Z ^a   Hall, S ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CAPACITANCE; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC INSULATORS; METAL INSULATOR BOUNDARIES; METALS; MIM DEVICES; SEMICONDUCTOR INSULATOR BOUNDARIES; TANTALUM OXIDES; TEMPERATURE DISTRIBUTION;

CONDUCTION MECHANISM; CONSTANT CURRENT STRESS; CONSTANT VOLTAGE STRESS; HIGH FREQUENCY CAPACITANCE; METAL INSULATOR METAL CAPACITOR (MIM); STRESS-INDUCED LEAKAGE CURRENT; TEMPERATURE DEPENDENCE; TIME DEPENDENT DIELECTRIC BREAKDOWN;

LEAKAGE CURRENTS;

EID: 79551617539     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3532823     Document Type: Conference Paper

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