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Journal of Materials Science: Materials in Electronics

Volumn 14, Issue 5-7, 2003, Pages 375-378

A comparative study of anodic tantalum pentoxide and high-pressure sputtered titanium oxide

(7) Duenas S a Castan H a Barbolla, J a San Andres E b Del Prado, A b Martil I b Gonzalez Diaz G b

a UNIVERSITY OF VALLADOLID (Spain)

b UNIVERSIDAD COMPLUTENSE DE MADRID (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC PROTECTION; CAPACITORS; ELECTRON DEVICE MANUFACTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH PRESSURE EFFECTS; ION BOMBARDMENT; SPUTTER DEPOSITION; SUBSTRATES; TANTALUM COMPOUNDS; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

ANODIC TANTALUM PENTOXIDE; HIGH PRESSURE SPUTTERING; STRUCTURAL DEFECTS;

FILM PREPARATION;

EID: 0037811381 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1023952718281 Document Type: Article

Times cited : (2)

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