Effects of postannealing on the electrical properties of Ta2O5 thin films deposited on TiN/T

Journal of Applied Physics

Volumn 88, Issue 12, 2000, Pages 7242-7248

  Chang, Chich Shang ^a   Liu, Tzu Ping ^a   Wu, Tai Bor ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001182113     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1326464     Document Type: Article

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