Atomic layer deposition and characterization of aluminum silicate thin films for optical applications

Journal of the Electrochemical Society

Volumn 158, Issue 2, 2011, Pages

  Hämäläinen, Jani ^a   Ihanus, Jarkko ^a   Sajavaara, Timo ^a,b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM SILICATES; HIGH-REFRACTIVE-INDEX MATERIALS; INTERFERENCE FILTERS; LAYER BY LAYER DEPOSITION; LOW-REFRACTIVE-INDEX MATERIALS; MULTILAYER INTERFERENCE; MULTILAYER STRUCTURES; OPTICAL APPLICATIONS; UNIFORM FILMS;

ALUMINOSILICATES; ALUMINUM; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; DEPOSITION; FILM PREPARATION; LIGHT REFRACTION; MULTILAYERS; OPTICAL MULTILAYERS; REFRACTIVE INDEX; REFRACTOMETERS; VAPOR DEPOSITION;

OPTICAL FILMS;

EID: 78650750576     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3519497     Document Type: Article

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