Analysis of ALD-processed thin films by ion-beam techniques

Analytical and Bioanalytical Chemistry

Volumn 382, Issue 8, 2005, Pages 1791-1799

  Putkonen, Matti ^a   Sajavaara, Timo ^b   Niinistö, Lauri ^a   Keinonen, Juhani ^c  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^c UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Atomic layer deposition; Electroluminescent displays; High k insulators; Ion beam techniques; Thin films

Indexed keywords

FLAT PANEL DISPLAYS; ION BEAMS; SEMICONDUCTOR DEVICE MANUFACTURE;

ATOMIC LAYER DEPOSITION (ALD); SEMICONDUCTOR INDUSTRY; THIN-FILM STRUCTURES;

THIN FILMS;

ION;

ARTIFICIAL MEMBRANE; METHODOLOGY; NANOTECHNOLOGY; REVIEW; SPECTROSCOPY;

IONS; MEMBRANES, ARTIFICIAL; NANOTECHNOLOGY; SPECTRUM ANALYSIS;

EID: 24044546522     PISSN: 16182642     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00216-005-3365-3     Document Type: Review

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