Pulsed deposition of silicate films

Journal of Applied Physics

Volumn 94, Issue 5, 2003, Pages 3657-3659

  He, W ^a   Solanki, R ^a   Conley Jr , J F ^b   Ono, Y ^b  

^a OREGON HEALTH AND SCIENCE UNIVERSITY   (United States)

^b SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; LOW TEMPERATURE OPERATIONS; PULSED LASER DEPOSITION; SILICATES; X RAY DIFFRACTION ANALYSIS;

METAL PRECURSORS;

SEMICONDUCTING FILMS;

EID: 0141633664     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1599976     Document Type: Article

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