Influence of C4F8/Ar/O2 plasma etching on SiO2 surface chemistry

Journal of Materials Science: Materials in Electronics

Volumn 16, Issue 8, 2005, Pages 541-547

  Krastev, Vesselin ^a   Reid, I ^a   Galassi, C ^b   Hughes, G ^a   McGlynn, E ^b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL REACTORS; COMPOSITION EFFECTS; ETCHING; FLUORINE COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; PLASMA ETCHING; SECONDARY ION MASS SPECTROMETRY; SURFACE CHEMISTRY; SURFACE REACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

COMMERCIAL REACTOR; ETCHING PLASMA; GASEOUS FLUORINE SPECIES;

SILICA;

EID: 24944447722     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10854-005-2730-5     Document Type: Article

References (20)

1. X. Li, L. Ling, X. Hua and G. Oehrlein, J. Vac. Sci. Technol. A (23) (2004) 500. 10.1116/1.1697482
2. A. N. Goyette, Y. Wang, M. Misakian and J. K. Olthoff, J. Vac. Sci. Technol. A 18 (2000) 2785. 10.1116/1.1308590
3. H. Hayashi, S. Morishita, T. Tatsumi, Y. Hikosaka, S. Noda, H. Nakagawa, S. Kobayashi, M. Inoe and T. Hoshibo, J. Vac. Sci. Technol. A 17 (1999) 2557. 10.1116/1.581997
4. K. Takahashi and K. Tachibana, J. Appl. Phys. 89 (2001) 893. 10.1063/ 1.1334636
5. K. Takahashi, A. Itoh, T. Nakamura and K. Tachibana, Thin Solid Films 374 (2000) 303. 10.1016/S0040-6090(00)01160-3
6. K. Takahashi, M. Hori and T. Goto, J. Vac. Sci. Technol. A (14) (1996) 2004. 10.1116/1.580075
7. L. T. Weng, G. Vereecke, M. G. Ganet, P. G. Rouxhet, J. H. Stone-Masui, P. Bertrand and W. E. E. Stone, Surf. Interface Anal. 20 (1993) 179. 10.1002/sia.740200302
8. J. H. Scofield, J. Electron. Spectrosc. Relat. Phenom. 8 (1976) 129. 10.1016/0368-2048(76)80015-1
9. B. Vincent Crist 2000 in "Handbook of Monochromatic XPS Spectra. Semiconductors" John Wiley and Sons New York
10. G. B. Smith, D. R. McKenzie and P. J. Martin, Phys. Status Solidi B 152 (1989) 475.
11. Kim and Kang, J. Phys. D. Appl. Phys. 30 1720.
12. Colthup, Daly and Wiberley "Infrared and Raman Spectroscopy" (ag.31-32, 359).
13. Kim and Lee, J. Applied Phys., 90 (7), 2001.
14. Narayanan, Kumar and Foo, Microelectronics journal 33 (2002), 971. 10.1016/S0026-2692(02)00075-7
15. Ding, Chen, Gong Wan and Zhang Materials Chemistry and Physics 71 (2001), 125. 10.1016/S0254-0584(00)00530-7
16. Secondary Ion Mass Spectrometry. "A Practical Handbook For Depth Profiling and Bulk Impurity Analysis." edited by R. G. Wilson, F. A. Stevie, C. W. Magee. (A Wiley-Interscience Publication. 1989).
17. N. W. Alcock 1990 in "Bonding and Structure" Ellis Horwood New York
18. L. Pauling 1963 in "The Nature of Chemical Bond" Cornell University Press Itaca, N.Y.
19. D. N. Belton and S. J. Schmieg, J. Vac. Sci. Tech. A 8 (3) (1990) 235.
20. D. Humbird, D. B. Graves, X. Hua and G. S. Oehrlein, Appl. Phys. Lett. 84 (7) (2004) 1073. 10.1063/1.1644338