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Journal of Photopolymer Science and Technology

Volumn 21, Issue 4, 2008, Pages 511-517

Electron beam and soft X-ray lithography with a monomolecular resist

(3) Ballav, Nirmalya a Chen, Chia Hao b Zharnikov, Michael a

a UNIVERSITY OF HEIDELBERG (Germany)

b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER (Taiwan)

Author keywords

Chemical pattern; Exchange reaction; Lithography; Self assembled monolayers

Indexed keywords

EID: 51149103270 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.21.511 Document Type: Article

Times cited : (18)

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