Abnormal pinning of the Fermi and vacuum levels in monomolecular self-assembled films

Chemical Physics Letters

Volumn 428, Issue 4-6, 2006, Pages 283-287

  Ahn, Heejoon ^a   Zharnikov, Michael ^b   Whitten, James E ^a  

^a University of Massachusetts Lowell   (United States)

^b UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS; ELECTRIC INSULATING MATERIALS; ELECTRON TUNNELING; FERMI LEVEL; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; VACUUM;

CONDUCTIVE SUBSTRATES; PHOTOELECTRON SPECTROMETERS; ULTRATHIN ORGANIC MONOMOLECULAR FILMS; VACUUM LEVEL;

MONOLAYERS;

EID: 33748063596     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2006.07.053     Document Type: Article

References (22)

1. Ratner B.D., and Castner D.G. In: Vickerman J.C. (Ed). Surface Analysis - The Principle Techniques (1997), Wiley & Sons, Chichester
2. Lewis R.T., and Kelly M.A. J. Elect. Spectrosc. Rel. Phenom. 20 (1980) 105
3. Lee Y., Morales G.M., and Yu L.P. Angew. Chem. Int. Ed. 44 (2005) 4228
4. Campbell I.H., Kress J.D., Martin R.L., Smith D.L., Barashkov N.N., and Ferraris J.P. Appl. Phys. Lett. 71 (1997) 3528
5. Wohltjen H., and Snow A.W. Anal. Chem. 70 (1998) 2856
6. Love J.C., Estroff L.A., Kriebel J.K., Nuzzo R.G., and Whitesides G.M. Chem. Rev. 105 (2005) 1103
7. Ulman A. An Introduction to Ultrathin Organic films (1991), Academic Press, San Diego
8. Boulas C., Davidovits J.V., Rondelez F., and Vuillaume D. Phys. Rev. Lett. 76 (1996) 4797
9. Rampi M.A., Schueller O.J.A., and Whitesides G.M. Appl. Phys. Lett. 72 (1998) 1781
10. Jung D.R., and Czanderna A.W. Crit. Rev. Solid State Mater. Sci. 19 (1994) 1
11. Hooper A., Fisher G.L., Konstadinidis K., Jung D., Nguyen H., Opila R., Collins R.W., et al. J. Am. Chem. Soc. 121 (1999) 8052
12. Ahn H., Kim M., Sandman D.J., and Whitten J.E. Langmuir 19 (2003) 5303
13. Blaszczyszyn R., Blaszczyszyn M., and Meclewski R. Surf. Sci. 51 (1975) 396
14. Wandelt K. In: Bonzel H.P., Bradshaw A.M., and Ertl G. (Eds). Physics and Chemistry of Alkali Metal Adsorption (1989), Elsevier, Amsterdam
15. Lu B., Zhang H.J., Li H.Y., Bao S.N., He P., and Hao T.L. Phys. Rev. B 68 (2003) 125410
16. Heister K., Johansson L.S.O., Grunze M., and Zharnikov M. Surf. Sci. 529 (2003) 36
17. Behm R.J., Brundle C.R., and Wandelt K. J. Chem. Phys. 85 (1986) 1061
18. Hulse J., Kueppers J., Wandelt K., and Ertl G. Appl. Surf. Sci. 6 (1980) 453
19. Chiang T.C., Kaindl G., and Mandel T. Phys. Rev. B 33 (1986) 695
20. Wandelt K. Appl. Surf. Sci. 111 (1997) 1
21. Tarlov M.J. Langmuir 8 (1992) 80
22. Razafitrimo H., Ettedgui E., Guo L.-H., McLendon G.L., and Gao Y. Appl. Phys. Lett. 67 (1995) 2621