Modification of semifluorinated alkanethiolate monolayers by low energy electron irradiation

Physical Chemistry Chemical Physics

Volumn 2, Issue 9, 2000, Pages 1979-1987

  Frey, S ^a   Heister, K ^a   Zharnikov, M ^a   Grunze, M ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALKANE; FLUORINE DERIVATIVE; THIOL DERIVATIVE;

ARTICLE; CHEMICAL BOND; CHEMICAL MODIFICATION; CONFORMATION; DESORPTION; DISSOCIATION; ELECTRON; IRRADIATION;

EID: 0034194656     PISSN: 14639076     EISSN: None     Source Type: Journal    
DOI: 10.1039/a910314g     Document Type: Article

References (57)

1. 1 B. Jäger, H. Schürmann, H. U. Müller, H.-J. Himmel, M. Neumann, M. Grunze and Ch. Wöll, Z. Phys. Chem., 1997, 202, 263.
2. 2 M. Wirde, U. Gelius, T. Dunbar and D. L. Allara, Nucl. Instrum. Methods Phys. Res., Sect. B, 1997, 131, 245.
3. 3 M. Zharnikov, W. Geyer, A. Gölzhäuser, S. Frey and M. Grunze, Phys. Chem. Chem. Phys., 1999, 1, 3163.
4. 4 R. C. Tiberio, H. G. Craighead, M. J. Lercel, T. Lau, C. W. Sheen and D. L. Allara, Appl. Phys. Lett., 1993, 62, 476.
5. 5 M. J. Lercel, R. C. Tiberio, P. F. Chapman, H. G. Craighead, C. W. Sheen, A. N. Parikh and D. L. Allara, J. Vac. Sci. Technol. B, 1993, 11, 2823.
6. 6 M. J. Lercel, G. F. Redinbo, F. D. Pardo, M. Rooks, R. C. Tiberio, P. Simpson, H. G. Craighead, C. W. Sheen, A. N. Parikh and D. L. Allara, J. Vac. Sci. Technol. B, 1994, 12, 3663.
7. 7 M. J. Lercel, G. F. Redinbo, M. Rooks, R. C. Tiberio, H. G. Craighead, C. W. Sheen and D. L. Allara, Microelectron. Eng., 1995, 27, 43.
8. 8 M. J. Lercel, M. Rooks, R. C. Tiberio, H. G. Craighead, C. W. Sheen, A. N. Parikh and D. L. Allara, J. Vac. Sci. Technol. B, 1995, 13, 1139.
9. 9 H. U. Müller, C. David, B. Völkel and M. Grunze, J. Vac. Sci. Technol. B, 1995, 13, 2846.
10. 10 C. David, H. U. Müller, B. Völkel and M. Grunze, Microelectron. Eng., 1996, 30, 57.
11. 11 M. J. Lercel, H. G. Craighead, A. N. Parikh, K. Seshadri and D. L. Allara, Appl. Phys. Lett., 1996, 68, 1504.
12. 12 R. Hild, C. David, H. U. Müller, B. Völkel, D. R. Kayser and M. Grunze, Langmuir, 1998, 14, 342.
13. 13 W. Geyer, V. Stadler, W. Eck, M. Zharnikov, A. Gölzhäuser and M. Grunze, Appl. Phys. Lett., 1999, 75, 2401.
14. 14 P. E. Laibinis, R. L. Graham, H. A. Biebuyck and G. M. Whitesides, Science, 1991, 254, 981.
15. 15 P. Rowntree, P.-C. Dugal, D. Hunting and L. Sanche, J. Phys. Chem., 1996, 100, 4546.
16. 16 C. Olsen and P. A. Rowntree, J. Chem. Phys., 1998, 108, 3750.
17. 17 H. U. Müller, M. Zharnikov, B. Volkel, A. Schertel, P. Harder and M. Grunze, J. Phys. Chem. B, 1998, 102, 7949.
18. 18 M. Zharnikov, S. Frey, K. Heister and M. Grunze, Langmuir, 2000, 16, 2697.
19. 19 K. Heister, S. Frey, A. Gölzhäuser, A. Ulman and M. Zharnikov, J. Phys. Chem. B, 1999, 103, 11098.
20. 20 A. Ulman, An Introduction to Ultra-thin Organic Films: Langmuir-Blodgett to Self-Assembly, Academic Press, New York, 1991; A. Ulman, Chem. Rev., 1996, 96, 1533.
21. 20 A. Ulman, An Introduction to Ultra-thin Organic Films: Langmuir-Blodgett to Self-Assembly, Academic Press, New York, 1991; A. Ulman, Chem. Rev., 1996, 96, 1533.
22. 21 H. Sellers, A. Ulman, Y. Scnidman and J. E. Eilers, J. Am. Chem. Soc., 1993, 115, 9389.
23. 22 Thin films: self-assembled monolayers of thiols, ed. A. Ulman, Academic Press, San Diego, 1998.
24. 23 P. Fenter, P. Eisenberger and K. S. Liang, Phys. Rev. Lett., 1993, 70, 2447.
25. 24 P. Fenter, A. Eberhardt and P. Eisenberger, Science, 1994, 266, 1216.
26. 25 (a) N. Camillone, C.E.D. Chidsey, G. Liu and G. Scoles, J. Chem. Phys., 1993, 98, 3503;
27. (b) N. Camillone, C. E. D. Chidsey, G. Liu and G. Scoles, J. Chem. Phys., 1993, 98, 4234.
28. 26 G. E. Poirier and M. J. Tarlov, Langmuir, 1994, 10, 2853.
29. 27 E. Delmarche, B. Michel, H. A. Biebuyck and G. Gerber, Adv. Mater., 1996, 8, 719.
30. 28 C. A. Alves and M. D. Porter, Langmuir, 1993, 9, 3507.
31. 29 D. G. Castner, K. B. Lewis, D. A. Fischer, B. D. Ratner and J. L. Gland, Langmuir, 1993, 9, 537.
32. 30 T. J. Lenk, V. M. Hallmark, C. L. Hoffmann, J. F. Rabolt, D. G. Castner, C. Erdelen and H. Ringsdorf, Langmuir, 1994, 10, 4610.
33. 31 G.-Y. Liu, P. Fenter, C. E. D. Chidsey, D. F. Ogletree, P. Eisenberger and M. Salmeron, J. Chem. Phys., 1994, 101, 4301.
34. 32 M.-W. Tsao, C. L. Hoffmann and J. F. Rabolt, Langmuir, 1997, 13, 4317.
35. 33 M. Monduzzi, Curr. Opin. Colloid Interface Sci., 1998, 3, 467.
36. 34 K. Tamada, J. Nagasawa, F. Nakanishi, K. Abe, M. Hara, W. Knoll, T. Ishida, H. Fukushima, S. Miyashita, T. Usui, T. Koini and T. R. Lee, Thin solid films, 1998, 327-329, 150.
37. 35 K. Tamada, T. Ishida, W. Knoll, H. Fukushima, T. Koini and T. R. Lee, in preparation.
38. 36 S. Frey, K. Heister, M. Zharnikov and M. Grunze, Israel J. Chem. (special issue), in the press.
39. 37 M. Graupe, T. Koini, V. Wang, G. M. Nassif, R. Colorado, Jr., R. J. Villazana, H. Dong, Y. F. Miura, O. E. Shmakova and T. R. Lee, J. Fluorine Chem., 1998, 93, 107.
40. 38 L. Strong and G. M. Whitesides, Langmuir, 1988, 4, 546.
41. 39 S. Bernstorff, W. Braun, M. Mast, W. Peatman and T. Schröder, Rev. Sci. Instrum., 1989, 60, 2097.
42. 40 J. Stöhr, NEXAFS Spectroscopy, Springer Series in Surface Science 25, Springer-Verlag, Berlin-Heidelberg, 1992.
43. 41 P. E. Batson, Phys. Rev. B, 1993, 48, 2608.
44. 42 J. F. Moulder, W. E. Stickle, P. E. Sobol and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, ed. J. Chastian, Perkin-Elmer Corporation, Eden Prairie, MN, 1992.
45. 43 D. A. Shirley, Phys. Rev. B, 1972, 5, 4709.
46. 44 G. K. Wertheim, M. A. Butler, K. W. West and D. N. E. Buchanan, Rev. Sci. Instrum., 1974, 45, 1369.
47. 45 C. D. Bain and G. M. Whitesides, J. Phys. Chem., 1989, 93, 1671.
48. 46 P. Harder, M. Grunze, R. Dahint, G. M. Whitesides and P. E. Laibinis, J. Phys. Chem., 1998, 102, 426.
49. 47 J. Thome, M. Himmelhaus, M. Zharnikov and M. Grunze, Langmuir, 1998, 14, 7435.
50. 48 T. Ohta, K. Seki, T. Yokoyama, I. Morisada and K. Edamatsu, Phys. Scr., 1990, 41, 150.
51. 49 G. Hähner, M. Kinzler, Ch. Wöll, M. Grunze, M. Scheller, L. S. Cederbaum, Phys. Rev. Lett., 1991, 67, 851; erratum, Phys. Rev. Lett., 1992, 69, 694.
52. 50 P. S. Bagus, K. Weiss, A. Schertel, Ch. Wöll, W. Braun, H. Hellwig and C. Jung, Chem. Phys. Lett., 1996, 248, 129.
53. 51 P. Väterlein, R. Fink, E. Umbach and W. Wurth, J. Phys. Chem., 1998, 108, 3313.
54. 52 D. A. Outka, J. Stöhr, J. P. Rabe and J. D. Swalen, J. Chem. Phys., 1988, 88, 4076.
55. 53 G. Hähner, M. Kinzler, C. Thümmler, Ch. Wöll and M. Grunze, J. Vac. Sci. Technol., 1992, 10, 2758.
56. 54 G. Beamson and D. Briggs, High Resolution XPS of Organic Polymers, John Wiley & Sons, Chichester, 1995.
57. 55 H. Rieley, G. K. Kendall, F. W. Zemicael, T. L. Smith and S. Yang, Langmuir, 1998, 14, 5147.