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Volumn 211, Issue 1, 2010, Pages 78-87

Photochemistry of photoresists and underlayer materials upon irradiation at 13.5nm

Author keywords

13.5nm; Extreme ultraviolet (EUV); Ionic outgassing; Photoresist; Pressure rise; Underlayer material

Indexed keywords


EID: 77950459615     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2010.02.008     Document Type: Article
Times cited : (4)

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