New developments in high-performance resist materials

Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 687-704

  Dammel, Ralph R ^a  

^a AZ Photoresist Products   (United States)

Author keywords

193 nm resist; 248 nm resist; Delay effects; Dnq novolak resist; DUV; Etch resistance; High low activation energy protective groups; Iso dense line bias; Main chain annelated systems; Methacrylate systems; R(m) curve; Selective dissolution; Tandem novolak

Indexed keywords

EID: 0000312064     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.687     Document Type: Article

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