Outgassing of photoresist materials at extreme ultraviolet wavelengths

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3364-3370

  Dentinger, Paul M ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; COPOLYMERS; DEGASSING; MASS SPECTROMETRY; POLYMETHYL METHACRYLATES; POLYSTYRENES; QUARTZ; SOLVENTS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV); QUARTZ CRYSTAL MICROBALANCE (QCM);

PHOTORESISTS;

EID: 0034317873     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1314383     Document Type: Article

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