Effects of material design on extreme ultraviolet (EUV) resist outgassing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Dean, Kim R ^a   Gonsalves, Kenneth E ^b   Thiyagarajan, Muthiah ^b,c  

^a SEMATECH   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c AZ Electronic Materials USA Corp   (United States)

Author keywords

EUV; Outgassing; Resist

Indexed keywords

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; PHOTOACID GENERATOR (PAG); RESIST;

DEGASSING; PHOTOLITHOGRAPHY; POLYMERS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

PHOTORESISTS;

EID: 33745605231     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657163     Document Type: Conference Paper

References (10)

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