An analysis of EUV resist outgassing measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Dean, Kim R ^a   Nishiyama, Iwao ^b   Oizumi, Hiroaki ^b   Keen, Anthony ^c   Cao, Heidi ^d   Yueh, Wang ^d   Watanabe, Takeo ^e   Lacovig, Paolo ^f   Rumiz, Luca ^f   Denbeaux, Greg ^g   Simon, Julia ^h  

^a SEMATECH   (United States)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c BOC Edwards   (United Kingdom)

^d INTEL CORPORATION   (United States)

^e UNIVERSITY OF HYOGO   (Japan)

^f SINCROTRONE TRIESTE   (Italy)

^g SUNY POLYTECHNIC INSTITUTE   (United States)

^h CEA LETI   (France)

Author keywords

EUV; Outgassing; Resist

Indexed keywords

HIGH VOLUME PRODUCTION TOOLS; OPTICS CONTAMINATION;

BENCHMARKING; DEGASSING; OPTICS; PHOTORESISTS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148815291     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712379     Document Type: Conference Paper

References (13)

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