Quantification of EUV resist outgassing

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 765-770

  Yueh, Wang ^a   Cao, Heidi B ^a   Thirumala, Vani ^a   Choi, Hokkin ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DEGASSING; GAS CHROMATOGRAPHY; IONS; IRRADIATION; MASS SPECTROMETRY; ULTRAVIOLET RADIATION;

EUV OPTICS; EUV RESISTS; LITHOGRAPHIC DOSE; OUTGASSING COMPONENTS;

PHOTORESISTS;

EID: 24644439997     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600540     Document Type: Conference Paper

References (10)

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