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Volumn 1, Issue 4, 2008, Pages 0470011-0470013

Enhancement of acid production in chemically amplified resist for extreme ultraviolet lithography

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; ELECTRON BEAM LITHOGRAPHY; FLUORINE; LASER PULSES; MULTIPHOTON PROCESSES; PHOTORESISTORS; PHOTORESISTS; POLYMERS; ROUGHNESS MEASUREMENT; ULTRAVIOLET DEVICES;

EID: 57049184187     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.047001     Document Type: Article
Times cited : (19)

References (29)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.