Fundamental studies of the properties of photoresists based on resins containing polymer-bound photoacid generators

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Lee, Cheng Tsung ^a   Jamagin, Nathan D ^b   Wang, Mingxing ^b   Gonsalves, Kenneth E ^b   Roberts, Jeanette M ^c   Yueh, Wang ^c   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM FORMATION; PHOTOACID DISTRIBUTION; PHOTOACID GENERATOR (PAG); PHOTORESIST RESIN;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHASE SEPARATION; POLYMERS; POLYMETHYL METHACRYLATES; RATE CONSTANTS;

PHOTORESISTS;

EID: 33745606484     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.663410     Document Type: Conference Paper

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