Outgassing of photoresists in extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3402-3407

  Chauhan, Maharshi M ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEGASSING; ESTERS; MASS SPECTROMETRY; POLYACRYLATES; POLYSTYRENES; RADIATION EFFECTS; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) RESISTS; EXTREME ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 0034316491     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321754     Document Type: Article

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