Quantitative measurement of EUV resist outgassing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Denbeaux, Greg ^a   Garg, Rashi ^a   Waterman, Justin ^a   Mbanaso, Chimaobi ^a   Netten, Jeroen ^a   Brainard, Robert ^a   Fan, Yu Jen ^a   Yankulin, Leonid ^a   Antohe, Alin ^a   DeMarco, Kevin ^a   Jaffe, Molly ^a   Waldron, Matthew ^a   Dean, Kim ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

Author keywords

EUV; Extreme ultraviolet lithography; Mass spectrometer; Outgassing; Photoresist

Indexed keywords

DEGASSING; EXTREME ULTRAVIOLET LITHOGRAPHY; MASS SPECTROMETERS; MULTILAYER FILMS; MULTILAYERS; ULTRAVIOLET RADIATION;

EUV OPTICS; MULTILAYER MIRRORS;

PHOTORESISTS;

EID: 35649002985     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.737192     Document Type: Conference Paper

References (9)

1. B. M. Mertens et al., Microelectronic Engineering June 2000, vol.53, no. 1-4, pp. 659-62
2. T. E. Madey et al., Applied Surface Science 15 Dec. 2006, vol.253, no.4, pp. 1691-708
3. S. Grantham et al., Proceedings of the SPIE 2005, vol.5751, no.1, pp. 1204-10
4. P. M. Dentinger et al., J. Vac. Sci. Technol. B, vol. 18, no. 6, pp. 3364-70 (2000)
5. T. Watanabe et al., Journal of Photopolymer Science and Technology 2001, vol.14, no.4, pp. 555-60
6. H. Hada et al, Proceedings of the SPIE 2004, vol.5374, no.1, pp. 686-94
7. M. M. Chauhan and P. F. Nealey, J. Vac. Sci. Technol. B, vol. 18, no. 6, 3402 (2000)
8. K. R. Dean., et al., "EUV Resist Outgassing Round Robin Results," 2006 EUVL Symposium Poster, October, 2006.
9. K. R. Dean, et al., "An analysis of EUV-resist outgassing measurements," Proceedings of the SPIE, vol. 6517, to be published, 2007.