Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas

Journal of Applied Physics

Volumn 107, Issue 5, 2010, Pages

  Bera, Kallol ^a   Rauf, Shahid ^a   Kenney, Jason ^a   Dorf, Leonid ^a   Collins, Ken ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AXIAL MAGNETIC FIELD; CAPACITIVELY COUPLED PLASMAS; CHAMBER CENTER; COIL CONFIGURATIONS; EFFECT OF MAGNETIC FIELD; ELECTRON CONFINEMENT; ELECTRON DENSITIES; ELECTRON LOSS; ELECTRON-NEUTRAL COLLISIONS; GAS PRESSURES; HIGH FREQUENCY; INHOMOGENEOUS MAGNETIC FIELD; MAGNETIC FIELD LINE; PLASMA DIFFUSION; PLASMA PROFILES; RADIAL DIRECTION; RADIAL MAGNETIC FIELD; SIMULATION RESULT; SPATIAL STRUCTURE; VERY HIGH FREQUENCY; VERY HIGH FREQUENCY PLASMA; VHF PLASMA; WAFER EDGE;

CARRIER CONCENTRATION; CHEMICAL BONDS; ELECTROMAGNETIC WAVES; ELECTRON DENSITY MEASUREMENT; ELECTRONEGATIVITY; ELECTRONS; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELDS; PLASMA CONFINEMENT; PRESSURE EFFECTS;

MAGNETIC MATERIALS;

EID: 77949711199     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3296349     Document Type: Article

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