SCOPUS 정보 검색 플랫폼

Plasma Sources Science and Technology

Volumn 14, Issue 2, 2005, Pages 329-335

Simulations of magnetized capacitively coupled plasmas operating at constant power and voltage

(1) Rauf, Shahid a

a FREESCALE SEMICONDUCTOR INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC POTENTIAL; ELECTRODES; ELECTRON MOBILITY; ENERGY UTILIZATION; MAGNETIC FIELD EFFECTS; MAGNETIZATION; NATURAL FREQUENCIES;

ELECTRON POWER; ELECTRONEGATIVE PLASMA DISCHARGES; ION POWER CONSUMPTION; RADIOFREQUENCY (RF);

MAGNETOPLASMA;

EID: 18744365812 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/14/2/015 Document Type: Article

Times cited : (14)

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