Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1600-1603

  Lindley, R A ^a   Bjorkman C H ^a   Shan, H ^a   Ke, K H ^a   Doan, K ^a   Mett, R R ^a   Welch, M ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; CATHODE SURFACE; DATA ANALYSIS METHODS; DC BIAS; DIELECTRIC ETCHES; DRIFT FORCE; EFFECT OF MAGNETIC FIELD; GATE OXIDE; HIGH POWER; MAGNETIC FIELD STRENGTHS; PLASMA NONUNIFORMITY; PLASMA UNIFORMITY; POTENTIAL DROP; PRIMARY EFFECTS; PROCESS PRESSURE; REACTIVE ION ETCH; RF-POWER; SIGNAL TO NOISE; STRONG ELECTRIC FIELDS;

DIELECTRIC MATERIALS; ELECTRIC FIELDS; INDUCTIVELY COUPLED PLASMA; MAGNETIC MATERIALS; MAGNETISM; WIRELESS TELECOMMUNICATION SYSTEMS;

MAGNETIC FIELD EFFECTS;

EID: 0041756572     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581126     Document Type: Article

References (3)

1. M. Sekine, M. Narita, S. Shimonishi, I. Sakai, K. Toinioka, K. Horioka, and H. Okano, Proceedings of the '93 Dry Process Symposium, Tokyo, Japan, 1993, p. 17.
2. H. Shin, N. Jha, X, Y. Qian, G. W. Hills, and C. Hu, Solid State Technol. 35, 29 (1993).
3. H. C. Shan, E. Lee, M. Welch, B. Pu, J. Carducci, K.-H. Ke, H. Gao, P. Luscher, G. Crean, R. Wang, R. Blume, J. Cooper, and R. Wu, J. Vac. Sci. Technol. B 14, 716 (1996).