Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 5, 2007, Pages 1420-1432

  Yang, Yang ^a   Kushner, Mark J ^a  

^a Iowa State University

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; MAGNETIC MATERIALS; MICROELECTRONICS; MICROFABRICATION; PLASMA DENSITY; REACTIVE ION ETCHING; VOLTAGE CONTROL;

FREQUENCY DISCHARGES; ION ENERGY DISTRIBUTIONS; MULTIFREQUENCY SOURCES; RADICAL FLUXES;

PLASMAS;

EID: 34548356903     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2771558     Document Type: Article

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