Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources

IEEE Transactions on Plasma Science

Volumn 27, Issue 5, 1999, Pages 1329-1338

  Rauf, Shahid ^a   Kushner, Mark J ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Gas discharge devices; Nonlinear circuits; Plasma material processing applications

Indexed keywords

CHEMICAL REACTIONS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; NONLINEAR NETWORKS; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA DEVICES; PLASMA SHEATHS;

RADIO FREQUENCY PLASMA PROCESSING REACTORS;

PLASMA SOURCES;

EID: 0033204739     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.799809     Document Type: Article

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