Modeling of magnetically enhanced capacitively coupled plasma sources: Ar discharges

Journal of Applied Physics

Volumn 94, Issue 3, 2003, Pages 1436-1447

  Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTRON EMISSION; IONIZATION; IONS; MAGNETIC FIELDS; PLASMA DENSITY; REACTIVE ION ETCHING; SURFACES;

MAGNETICALLY ENHANCED CAPACITIVELY COUPLED PLASMA;

PLASMAS;

EID: 0041510476     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1587887     Document Type: Article

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