Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon

Physical Review B - Condensed Matter and Materials Physics

Volumn 79, Issue 11, 2009, Pages

  Keller, Adrian ^a   Cuerno, Rodolfo ^b   Facsko, Stefan ^a   Möller, Wolfhard ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b UNIVERSIDAD CARLOS III DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 65349160312     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.79.115437     Document Type: Article

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