The effect of redeposition on the ion flux dependence of Si dot pattern formation during ion sputter erosion

Journal of Physics Condensed Matter

Volumn 18, Issue 13, 2006, Pages 3367-3375

  Fan, Wen Bin ^a   Ling, Li ^a   Qi, Le Jun ^a   Li, Wei Qing ^a   Sun, Hai Tong ^a   Gu, Chang Xin ^a   Zhao, You Yuan ^a   Lu, Ming ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EROSION; MATHEMATICAL MODELS; MORPHOLOGY; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

ION FLUX; ION SPUTTER EROSION; KURAMOTO-SIVASHINSKY EQUATION;

SILICON;

EID: 33645065113     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/18/13/004     Document Type: Article

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