High-rate, room temperature plasma-enhanced deposition of aluminum-doped zinc oxide nanofilms for solar cell applications

Journal of Alloys and Compounds

Volumn 485, Issue 1-2, 2009, Pages 379-384

  Chua, B S ^a   Xu, S ^a   Ren, Y P ^a   Cheng, Q J ^b   Ostrikov, K ^b,c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b CSIRO   (Australia)

^c UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Aluminum doping; Low temperature plasmas; Thin film solar cells; Zinc oxide

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL SHEET RESISTANCE; GLASS SUBSTRATES; HIGH GROWTH RATE; HIGH RATE; LOW TEMPERATURE PLASMAS; NANO FILMS; OPTICAL TRANSPARENCY; RADIO-FREQUENCY-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SOLAR-CELL APPLICATIONS; TARGET POWER; THIN-FILM SOLAR CELLS; UNIQUE FEATURES; VISIBLE SPECTRA; ZNO;

ALUMINUM; DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM GROWTH; FLAT PANEL DISPLAYS; INDUCTIVELY COUPLED PLASMA; MAGNETIC FILMS; MAGNETRONS; OPTICAL PROPERTIES; PLASMA DEPOSITION; POWER SPECTRUM; SEMICONDUCTING ZINC COMPOUNDS; SOLAR CELLS; SOLAR POWER GENERATION; THIN FILM DEVICES; TOKAMAK DEVICES; ZINC;

ZINC OXIDE;

EID: 72049107723     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.05.099     Document Type: Article

References (47)

1. Guo W., Katz M.B., Nelson C.T., Heeg T., Schlom D.G., Liu B., Che Y., and Pan X.Q. Appl. Phys. Lett. 94 (2009) 122107
2. Xu M., Zhao H., Duan M.Y., and Xu L.X. J. Appl. Phys. 105 (2009) 043708
3. Zhang Y., Wu L., Li H., Xu J., Han L., Wang B., Tuo Z., and Xie E. J. Alloys Compd. 473 (2009) 319
4. Cvelbar U., Drenik A., and Mozetic M. Appl. Phys. Lett. 92 (2008) 133505
5. Pan X.Q., Sun H.P., Du X.L., Mei Z.X., Zeng Z.Q., and Xue Q.K. Appl. Phys. Lett. 85 (2004) 4385
6. Chen Z., Mozetic M., He J., and Sunkara M.K. Chem. Mater. 20 (2008) 3224
7. Cvelbar U., and Mozetič M. J. Phys. D: Appl. Phys. 40 (2007) 2300
8. Zhong X.X., Zhou W., Wu X.C., Yuan L.Q., Shu Q.W., Li W., and Xia Y.X. J. Phys. D: Appl. Phys. 40 (2007) 219
9. Bacaksiz E., Yi{dotless}lmaz S., Parlak M., Varilci A., and Altunbas M. J. Alloys Compd. 478 (2009) 367
10. Yang D.S., Lao C., and Zewail A.H. Science 321 (2008) 1660
11. Yang W., Liu Z., Peng D., Zhang F., Huang H., Xie Y., and Wu Z. Appl. Surf. Sci. 255 (2009) 5669
12. Huang S.Y., Xu S., Chai J.W., Cheng Q.J., Long J.D., and Ostrikov K. Mater. Lett. 63 (2009) 972
13. Park Y.R., Kim E.K., Jung D., Park T.S., and Kim Y.S. Appl. Surf. Sci. 254 (2008) 2250
14. Suwanboon S., Amornpitoksuk P., Haidoux A., and Tedenac J.C. J. Alloys Compd. 462 (2008) 335
15. Liu C.P., and Jeng G.R. J. Alloys Compd. 468 (2009) 343
16. Singh P., Kaushal A., and Kaur D. J. Alloys Compd. 471 (2009) 11
17. Yang J.H., Zhao L.Y., Zhang Y.J., Wang Y.X., and Liu H.L. J. Alloys Compd. 473 (2009) 543
18. Hsi C.S., Houng B., Hou B.Y., Chen G.J., and Fu S.L. J. Alloys Compd. 464 (2008) 89
19. Selmi M., Chaabouni F., Abaab M., and Rezig B. Superlattices Microstruct. 44 (2008) 268
20. Bhuvana K.P., Elanchezhiyan J., Gopalakrishnan N., and Balasubramanian T. J. Alloys Compd. 473 (2009) 534
21. Hong R., Shao J., He H., and Fan Z. Appl. Surf. Sci. 252 (2006) 2888
22. Ayouchi R., Martin F., Leinen D., and Barrado J.R.R. J. Cryst. Growth 247 (2003) 497
23. Ohshima T., Thareja R.K., Ikegami T., and Ebihara K. Surf. Coat. Technol. 169-170 (2003) 517
24. Mandal S., Singha R.K., Dhar A., and Ray S.K. Mater. Res. Bull. 43 (2008) 244
25. Flickyngerova S., Shtereva K., Stenova V., Hasko D., Novotny I., Tvarozek V., Sutta P., and Vavrinsky E. Appl. Surf. Sci. 254 (2008) 3643
26. Park K.C., Ma D.Y., and Kim K.H. Thin Solid Films 305 (1997) 201
27. Xu S., Ostrikov K.N., Li Y., Tsakadze E.L., and Jones I.R. Phys. Plasmas 8 (2001) 2549
28. Ostrikov K.N., Xu S., and Yu M.Y. J. Appl. Phys. 88 (2000) 2268
29. Xu S., Ostrikov K., Long J.D., and Huang S.Y. Vacuum 80 (2006) 621
30. Cheng Q.J., Xu S., Long J.D., and Ostrikov K. Appl. Phys. Lett. 90 (2007) 173112
31. Song D.Y., Widenborg P., Chin W., and Aberle A.G. Sol. Energy Mater. Sol. Cells 73 (2002) 1
32. Kim H., Horwitz J.S., Qadri S.B., and Chrisey D.B. Thin Solid Films 420-421 (2002) 107
33. Ratana T., Amornpitoksuk P., Ratana T., and Suwanboon S. J. Alloys Compd. 470 (2009) 408
34. Rozati S.M., and Akesteh S. Mater. Charact. 58 (2007) 319
35. Lin K., and Tsai P. Mater. Sci. Eng. B 139 (2007) 81
36. Chen M., Pei Z.L., Wang X., Sun C., and Wen L.S. Mater. Lett. 48 (2001) 137
37. Ostrikov K. Rev. Mod. Phys. 77 (2005) 489
38. Denysenko I., Yu M.Y., and Azarenkov N.A. Phys. Rev. E 74 (2006) 036402
39. Xu S., Li H.S., Li Y.A., Lee S., and Huan C.H.A. Chem. Phys. Lett. 287 (1998) 731
40. Cheng Q.J., Long J.D., and Xu S. J. Appl. Phys. 101 (2007) 094304
41. Cheng Q.J., Long J.D., Chen Z., and Xu S. J. Phys. D: Appl. Phys. 40 (2007) 2304
42. Cheng Q.J., Xu S., Huang S.Y., Long J.D., Ren Y.P., Xu M., and Ostrikov K. IEEE Trans. Plasma Sci. 36 (2008) 870
43. Huang S.Y., Ostrikov K., and Xu S. J. Appl. Phys. 104 (2008) 033301
44. Rutkevych P.P., Ostrikov K., Xu S., and Vladimirov S.V. J. Appl. Phys. 96 (2004) 4421
45. Levchenko I., and Ostrikov K. J. Phys. D: Appl. Phys. 40 (2007) 2308
46. Ostrikov K., and Murphy A.B. J. Phys. D: Appl. Phys. 40 (2007) 2223
47. Ostrikov K., Long J.D., Rutkevych P.P., and Xu S. Vacuum 80 (2006) 1126