Influence of buffer layer thickness on the structure and optical properties of ZnO thin films

Applied Surface Science

Volumn 252, Issue 8, 2006, Pages 2888-2893

  Hong, Ruijin ^a,b   Shao, Jianda ^a   He, Hongbo ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Photoluminescence; Sputtering; Structure; Zinc Oxide

Indexed keywords

MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

BUFFER LAYER THICKNESS; COULOMB INTERACTION; NEAR-BAND-EDGE; STRUCTURE;

ZINC OXIDE;

EID: 31144466522     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.04.041     Document Type: Article

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