Optimization of Zn1-xAlxO film for antireflection coating by RF sputtering

Journal of Alloys and Compounds

Volumn 473, Issue 1-2, 2009, Pages 534-537

  Bhuvana, K P ^a   Elanchezhiyan, J ^a   Gopalakrishnan, N ^a   Balasubramanian, T ^a  

^a NATIONAL INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Antireflection coating; Sputtering; X ray diffraction; ZnO

Indexed keywords

ANTIREFLECTION COATINGS; COATINGS; CONCENTRATION (PROCESS); DIFFRACTION; ELECTRIC PROPERTIES; ELECTRODEPOSITION; HALL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; REFLECTION; SEMICONDUCTING ZINC COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

AL CONCENTRATIONS; AL-DOPED ZNO; CONCENTRATION OF; ELECTRON CONCENTRATIONS; FULL WIDTH AT THE HALF MAXIMUMS; HALL MEASUREMENTS; HALL-EFFECT MEASUREMENTS; LOW RESISTIVITIES; OPTICAL AND ELECTRICAL PROPERTIES; PREFERRED ORIENTATIONS; R F SPUTTERING; REFLECTANCE MEASUREMENTS; RF- MAGNETRON SPUTTERING; SI(1 0 0 ); SINGLE-CRYSTALLINE; XRD ANALYSIS; ZNO;

ALUMINUM;

EID: 61449172158     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.06.035     Document Type: Article

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