Inductively coupled plasma-assisted RF magnetron sputtering deposition of highly uniform SiC nanoislanded films

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 1, 2008, Pages 870-871

  Cheng, Qijin ^a,b   Xu, Shuyan ^b   Huang, Shiyong ^b   Long, Jidong ^b   Ren, Yuping ^b   Xu, Ming ^c   Ostrikov, Kostya ^a,d  

^a UNIVERSITY OF SYDNEY   (Australia)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c SICHUAN NORMAL UNIVERSITY   (China)

^d CSIRO   (Australia)

Author keywords

Amorphous magnetic materials; Films; Inductively coupled plasma (ICP); Magnetron sputtering; Nanoislanded SiC; Plasmas; Radio frequency; Silicon carbide; Sputtering; Substrates

Indexed keywords

AMORPHOUS FILMS; ELECTRIC DISCHARGES; INDUCTIVELY COUPLED PLASMA; MAGNETRONS; PHOTORESISTS; PLASMA DEPOSITION; PLASMAS; PULSED LASER DEPOSITION; SILICON CARBIDE; SPUTTER DEPOSITION; STOICHIOMETRY;

AMORPHOUS MAGNETIC MATERIALS; AMORPHOUS SIC; COUPLED PLASMAS; DEPOSITION TECHNIQUES; FILMS; INDUCTIVELY COUPLED PLASMA (ICP); NANOISLANDED SIC; PLASMA PRODUCTION; PLASMA SCIENCE; RADIO FREQUENCY; RF-MAGNETRON SPUTTERING; SPUTTERING; SUBSTRATES;

MAGNETRON SPUTTERING;

EID: 50249109101     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.927350     Document Type: Article

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