Chemically active plasmas for deterministic assembly of nanocrystalline SiC film

Journal of Physics D: Applied Physics

Volumn 40, Issue 8, 2007, Pages 2304-2307

  Cheng, Q J ^a   Long, J D ^a   Chen, Z ^b   Xu, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; NANOCRYSTALLINE SILICON; SELF ASSEMBLY; SILICON CARBIDE; STRUCTURAL RELAXATION;

AMORPHOUS NETWORKS; NANOCRYSTALLINE FILMS; RF MAGNETRON SPUTTERING SYSTEM;

THIN FILMS;

EID: 34248344880     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/8/S10     Document Type: Article

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