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Volumn 468, Issue 1-2, 2009, Pages 343-349
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Properties of aluminum doped zinc oxide materials and sputtering thin films
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Author keywords
Oxide material; Powder metallurgy; SEM; Sintering; X ray diffraction
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Indexed keywords
ALUMINUM;
ALUMINUM POWDER METALLURGY;
CONCRETE CONSTRUCTION;
DIFFRACTION;
FILMS;
MAGNETRON SPUTTERING;
MATERIALS PROPERTIES;
METALLIC FILMS;
METALLURGY;
PLASMA STABILITY;
POWDER METALLURGY;
POWDERS;
SEMICONDUCTING ZINC COMPOUNDS;
SINTERING;
TARGETS;
THIN FILM DEVICES;
THIN FILMS;
X RAY ANALYSIS;
X RAY DIFFRACTION;
ZINC;
ZINC OXIDE;
CERAMIC TARGETS;
DISPERSANTS;
OXIDE MATERIAL;
RF MAGNETRON SPUTTERING;
SEM;
TEMPERATURE RANGES;
WURZITE;
XRD MEASUREMENTS;
ZNO THIN FILMS;
ZNO:AL FILMS;
OXIDE FILMS;
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EID: 58049216464
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2008.01.053 Document Type: Article |
Times cited : (48)
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References (12)
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