Growth of transparent conducting nano-structured In doped ZnO thin films by pulsed DC magnetron sputtering

Applied Surface Science

Volumn 254, Issue 8, 2008, Pages 2250-2254

  Park, Young Ran ^a   Kim, Eung Kwon ^b   Jung, Donggeun ^a   Park, Tae Seok ^b   Kim, Young Sung ^b  

^a Institute for Basic Science   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

In doped ZnO (IZO); Nano structured; Pulse DC magnetron sputtering; Transparent conducting oxide (TCO)

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM GROWTH; MAGNETRON SPUTTERING; THIN FILMS; ZINC OXIDE;

ELECTRICAL RESISTIVITY; PULSED FREQUENCY; SUBSTRATE TEMPERATURE;

NANOSTRUCTURED MATERIALS;

EID: 38749139961     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.09.008     Document Type: Article

References (20)

1. Kon M., Song P.K., Shigesato Y., Frach P., Ohno S., and Suzuki K. Jpn. J. Appl. Phys. 42 (2003) 263
2. Sohn S., Park K., Lee D., Jung D., Kim H.M., Manna U., Yi J., Boo J.-H., Chae H., and Kim H. Jpn. J. Appl. Phys. 45 (2006) 3733
3. He Y., and Kanicki J. Appl. Phys. Lett. 76 (2000) 661
4. Kim H., Gilmore C.M., Horwitz J.S., Pique A., Murata H., Kushto G.P., Schlaf R., Kafafi Z.H., and Chrisey D.B. Appl. Phys. Lett. 76 (2000) 259
5. Ho J.-J., and Chen C.-Y. J. Electrochem. Sci. 152 (2005) G57
6. Hao X.-T., Tan L.-W., Ong K.-S., and Zhu F. J. Cryst. Growth 287 (2006) 44
7. Kim K.J., and Park Y.R. Appl. Phys. Lett. 78 (2001) 475
8. Jedrecy N., Von Bardeleben H.J., Zheng Y., and Cantin J.-L. Phys. Rev. B 69 (2004) 1
9. Ohyama M., Kozuka H., and Yoko T. Thin Solid Films 306 1 (1997) 78
10. Brehm J.U., Winterer M., and Hahn H. J. Appl. Phys. 100 (2006) 064311
11. Kelly P.J., and Arnell R.D. Vacuum 56 (2000) 159
12. Ko H., Tai W.-P., Kim K.-C., Kim S.-H., Suh S.-J., and Kim Y.-S. J. Cryst. Growth 277 (2005) 352
13. Shannon R.D. Acta Crystallogr. A 32 (1976) 751
14. Bunshah R.F., et al. Deposition Technologies for Films and Coatings (1982), Noyes Publications, Park Ridge p. 213
15. Mirica E., Kowach G., Evans P., and Du H. Morphological evolution of ZnO thin films deposited by reactive sputtering. Cryst. Growth Des. 4 1 (2004) 147
16. Smith R.A. Semiconductors (1968), Cambridge University, Cambridge p. 189
17. Sernelius B.E., Berggren K.-F., Jin Z.-C., Hamberg I., and Granqvist C.G. Phys. Rev. B 37 (1988) 10244
18. Ashkenov N., Mbenkum B.N., Bundesmann C., Riede V., Lorenz M., Spemann D., Kaidashev E.M., Kasic A., Schubert M., Grundmann M., Wagner G., Neumann H., Darakcjieva V., Arwin H., and Monemar B. J. Appl. Phys. 93 (2003) 126
19. Bundesmann C., Ashkenov N., Schubert M., Spemann D., Butz T., Kaidashev E.M., Lorenz M., and Grundmann M. Appl. Phys. Lett. 83 (2003) 1974
20. Wang J.B., Huang G.J., Zhong X.L., Sun L.Z., Zhou Y.C., and Liu E.H. Appl. Phys. Lett. 88 (2006) 252502