Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

Applied Surface Science

Volumn 255, Issue 11, 2009, Pages 5669-5673

  Yang, Weifeng ^a   Liu, Zhuguang ^a   Peng, Dong Liang ^a   Zhang, Feng ^a   Huang, Huolin ^a   Xie, Yannan ^a   Wu, Zhengyun ^a  

^a XIAMEN UNIVERSITY   (China)

Author keywords

AZO film; Low temperature deposition; RF magnetron sputtering; Transparent conductive oxide

Indexed keywords

ALUMINUM OXIDE; ARGON; II-VI SEMICONDUCTORS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; SEMICONDUCTOR DOPING; SUBSTRATES; TEMPERATURE; THIN FILMS; TRANSPARENT ELECTRODES; X RAY DIFFRACTION; ZINC OXIDE;

AZO FILMS; LIGHT EMITTING DIODE (LEDS); LOW-TEMPERATURE DEPOSITION; OPTICAL TRANSMISSION SPECTROSCOPY; RF MAGNETRON SPUTTERING METHOD; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE DEPOSITION; TRANSPARENT CONDUCTIVE OXIDES;

CONDUCTIVE FILMS;

EID: 60949091424     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.12.021     Document Type: Article

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