The wide band gap of highly oriented nanocrystalline Al doped ZnO thin films from sol-gel dip coating

Journal of Alloys and Compounds

Volumn 470, Issue 1-2, 2009, Pages 408-412

  Ratana, T ^a,c   Amornpitoksuk, P ^b   Suwanboon, S ^b  

^a KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

^b PRINCE OF SONGKLA UNIVERSITY   (Thailand)

^c KING MONGKUT'S UNIVERSITY OF TECHNOLOGY NORTH BANGKOK   (Thailand)

Author keywords

Nanostructured materials; Optical properties; Sol gel processes; Thin films; Zinc oxide

Indexed keywords

ALUMINUM; CHEMICAL SENSORS; CHLORINE COMPOUNDS; COLLOIDS; ENERGY GAP; GELATION; GELS; GRAIN SIZE AND SHAPE; MATERIALS PROPERTIES; METALLIC FILMS; NANOCRYSTALLINE ALLOYS; NANOSTRUCTURED MATERIALS; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; SEMICONDUCTING ZINC COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLIDS; SOLS; THIN FILMS; ZINC; ZINC COMPOUNDS; ZINC OXIDE;

AFM IMAGES; AL DOPED ZNO THIN FILMS; ALUMINIUM CHLORIDE HEXAHYDRATES; AVERAGE GRAIN SIZES; GLASS SUBSTRATES; NANO-CRYSTALLINE; OPTICAL BAND-GAP; PREFERENTIAL ORIENTATIONS; SOL-GEL DIP COATINGS; SOL-GEL PROCESSES; WIDE BAND GAPS; XRD PATTERNS; ZINC ACETATE DIHYDRATE; ZNO THIN FILMS;

FILMS;

EID: 59449106814     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.02.081     Document Type: Article

References (25)

1. Bao D., Gu H., and Kuang A. Thin Solid Films 312 (1998) 37-39
2. Majumder S.B., Jain M., Dobal P.S., and Katiyar R.S. Mater. Sci. Eng. B 103 (2003) 16-25
3. Zhang D.H., and Brodie D.E. Thin Solid Films 261 (1995) 334-339
4. Patil D.R., and Patil L.A. Sens. Actuators B Chem. 123 (2007) 546-553
5. Lee J., Lee D., Lim D., and Yang K. Thin Solid Films 515 (2007) 6094-6098
6. Banu Bahsi Z., and Yavuz Oral A. Opt. Mater. 29 (2007) 672-678
7. Meng X., Lin B., and Fu Z. J. Lumin. 126 (2007) 230-238
8. Hsieh P.T., Chen Y.C., Kao K.S., and Wang C.M. Phys. B 392 (2007) 332-336
9. Razati S.M., and Akesteh Sh. Mater. Charact. 58 (2007) 319-322
10. Tokumoto M.S., Smith A., Santilli C.V., Pulcinelli S.H., Craievich A.F., Elkaim E., Traverse A., and Briois V. Thin Solid Films 416 (2002) 284-293
11. Zhang R., and Kerr l.L. J. Solid State Chem. 180 (2007) 988-994
12. Vafae M., and Ghamsari M.S. Mater. Lett. 61 (2007) 3265-3268
13. Lin K.M., and Tsai P. Thin Solid Films 515 (2007) 8601-8604
14. Zhou H.M., Yi D.Q., Yu Z.M., Xiao L.R., and Li J. Thin Solid Films 515 (2007) 6909-6914
15. Amirhaghi S., Craciun V., Craciun D., Elders J., and Bord I.W. Microelectron. Eng. 25 (1994) 321-326
16. Oral A.Y., Bashi Z.B., and Aslan M.H. Appl. Surf. Sci. 253 (2007) 4593-4598
17. Liu Z., Li J., Ya J., Xin Y., and Jin Z. Mater. Lett. 62 (2008) 1190-1193
18. Musat V., Teixeira B., Fortunato E., Monteiro R.C.C., and Vilarinho P. Surf. Sci. Technol. 180-181 (2004) 659-662
19. S. Suwanboon, P. Amornpitoksuk, A. Haidoux, J.C. Tedenac, J. Alloys Comp., in press.
20. Fujihara S., Sasaki C., and Kimura T. J. Eur. Ceram. Soc. 21 (2001) 2109-2112
21. Kelsall R.W., Hamley I.W., and Geoghegan M. Nanoscale Science and Technology (2005), John Wiley & Sons, West Sussex
22. ChangChun C., BenHai Y., JiangFeng L., QiRun D., and YunFeng Z. Mater. Lett. 61 (2007) 2961-2964
23. L. Irimpan, A. Deepthy, B. Krishnan, L.M. Kukreja, V.P.N. Nampoori, P. Radhakrishnan, Opt. Commun., in press.
24. Joseph B., Manoj P.K., and Vaidyah V.K. Ceram. Int. 32 (2006) 487-493
25. Jeon K.A., Kim J.H., Shim W.Y., Lee W.Y., Jung M.H., and Lee S.Y. J. Cryst. Growth 287 (2006) 66-69