Experimental thermodynamics for the evaluation of ALD growth processes

Surface and Coatings Technology

Volumn 204, Issue 6-7, 2009, Pages 882-886

  Violet, P ^a   Blanquet, E ^a   Monnier, D ^a,b   Nuta, I ^a   Chatillon, C ^a  

^a UNIV GRENOBLE ALPES   (France)

^b STMICROELECTRONICS   (France)

Author keywords

ALD process; Knudsen cell; Mass spectrometry; Organometallic precursors; Thermodynamics; Vapor pressure

Indexed keywords

ALD GROWTH; CVD PROCESS; GAS-PHASE CHEMICAL REACTIONS; GASEOUS PRECURSORS; KNUDSEN CELL; ORGANO-METALLIC MOLECULES; ORGANOMETALLIC PRECURSORS; THERMAL STABILITY; THERMALLY UNSTABLE; ULTRATHIN LAYERS;

CHEMICAL VAPOR DEPOSITION; GRAFTING (CHEMICAL); HYDROSTATIC PRESSURE; MASS SPECTROMETERS; MASS SPECTROMETRY; ORGANOMETALLICS; SYNTHESIS (CHEMICAL); TANTALUM COMPOUNDS; THERMODYNAMICS; VAPOR PRESSURE; VAPORS;

SURFACE REACTIONS;

EID: 71849086791     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.08.022     Document Type: Article

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